Datasets:

Taylor658
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SiN-photonic-waveguide-loss-efficiency

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train · 90k rows

waveguide_width float32 0.5 2	waveguide_height float32 200 600	cladding_material stringclasses 3 values	cladding_thickness float32 1 5	deposition_method stringclasses 3 values	etch_method stringclasses 3 values	sidewall_roughness float32 0.5 5	annealing_params stringclasses 4 values	wavelength float32 1.5k 1.6k	polarization stringclasses 2 values	input_power float32 -10 10	temperature float32 20 80	bend_radius float32 20 200	device_length float32 1 50	insertion_loss float32 0.53 26.5	propagation_loss float32 0.1 5	coupling_efficiency_input float32 40 90	coupling_efficiency_output float32 40 90	scattering_loss float32 0.01 0.5	effective_index float32 1.5 2	mode_confinement_factor float32 0.7 0.95	batch_id stringclasses 50 values	data_source stringclasses 2 values	measurement_method stringclasses 4 values	uncertainty float32 0.01 0.2
0.56	265.649994	SiO2	4.2	LPCVD	Wet Etch	3.42	No_Anneal	1,577.310059	TE	0.37	36.27	186.460007	14.23	6.744	4.074	77.489998	45.860001	0.222	1.622	0.824	BATCH_34	Synthetic	OTDR	0.034
1.975	451.279999	SiO2	1.98	LPCVD	Wet Etch	3.81	900C_1hr	1,590.52002	TM	-8.85	59.450001	88.129997	40.830002	14.229	3.222	54.77	80.529999	0.112	1.603	0.726	BATCH_43	Synthetic	OTDR	0.105
1.725	281.850006	Polymer	4.92	Sputtering	ICP	4.67	900C_3hr	1,510.869995	TM	-8.69	23.139999	80.309998	42.189999	8.082	1.621	73.68	74.07	0.082	1.568	0.896	BATCH_3	Measurement	ring_resonance	0.143
0.625	326.309998	Polymer	4.74	LPCVD	Wet Etch	0.57	900C_3hr	1,523	TE	7.27	21.940001	34.400002	11.45	2.859	0.896	52.919998	54.330002	0.165	1.925	0.743	BATCH_46	Measurement	microring_Q	0.065
0.671	500.690002	Polymer	3.87	LPCVD	ICP	4.8	1000C_1hr	1,534.099976	TE	7.4	21.08	112.410004	5.39	3.448	3.709	76.660004	85.940002	0.161	1.61	0.772	BATCH_47	Measurement	cut-back	0.025
1.687	243.110001	Air	1.55	Sputtering	ICP	3.43	1000C_1hr	1,507.089966	TM	-9.58	33.630001	145.320007	23.809999	11.6	4.101	77.940002	71.220001	0.191	1.676	0.886	BATCH_22	Synthetic	ring_resonance	0.147
1.936	400.26001	SiO2	4.48	LPCVD	ICP	1.5	900C_3hr	1,518.359985	TE	-7.71	67.349998	113.629997	6.13	2.523	2.735	43.209999	65.029999	0.099	1.534	0.836	BATCH_9	Measurement	microring_Q	0.056
1.416	566.130005	Polymer	2.49	Sputtering	Wet Etch	4.58	1000C_1hr	1,525.23999	TM	6.37	70.839996	50.23	32.759998	10.334	2.827	58.259998	70.129997	0.387	1.813	0.908	BATCH_23	Synthetic	microring_Q	0.19
1.261	455.529999	Polymer	4.22	Sputtering	RIE	1.27	No_Anneal	1,590.52002	TE	-7.15	46.619999	90.559998	47.619999	21.631001	4.403	86.489998	73.059998	0.071	1.817	0.757	BATCH_32	Measurement	OTDR	0.109
1.109	589.400024	Polymer	1.26	LPCVD	Wet Etch	3.93	900C_1hr	1,524.48999	TM	-6.39	20.5	134.119995	10.2	3.37	1.812	84.43	76.269997	0.441	1.826	0.879	BATCH_1	Measurement	OTDR	0.043
1.713	417.730011	Air	3.02	Sputtering	RIE	3.8	No_Anneal	1,598.150024	TE	-7.15	36.900002	117.550003	18.440001	8.372	3.655	46.970001	83.209999	0.44	1.946	0.913	BATCH_44	Synthetic	OTDR	0.091
1.577	559.48999	Air	2.57	LPCVD	Wet Etch	4.05	900C_1hr	1,514.910034	TE	-2.02	62.799999	141.520004	38.599998	15.221	3.426	67.620003	72.529999	0.143	1.534	0.872	BATCH_44	Synthetic	ring_resonance	0.099
1.849	566.830017	Polymer	2.21	PECVD	Wet Etch	1	No_Anneal	1,531.609985	TE	4.92	68.349998	37.91	35.400002	17.117001	4.692	76.370003	63.939999	0.115	1.568	0.943	BATCH_30	Synthetic	ring_resonance	0.118
0.721	308.529999	Air	4.54	LPCVD	ICP	1.62	1000C_1hr	1,508.449951	TM	-9.71	51.580002	195.190002	48.490002	4.078	0.441	55.68	76.730003	0.189	1.501	0.909	BATCH_13	Measurement	ring_resonance	0.038
1.803	369.279999	Polymer	2.48	Sputtering	ICP	3.12	900C_1hr	1,515.390015	TE	2.23	73.239998	102.089996	26.24	4.979	1.384	79.199997	72.739998	0.118	1.743	0.887	BATCH_28	Measurement	ring_resonance	0.124
1.894	216.860001	Polymer	2.45	PECVD	Wet Etch	3.75	900C_3hr	1,548.160034	TE	6.89	49.389999	184.130005	28.360001	7.837	2.532	41.240002	56.880001	0.243	1.988	0.802	BATCH_43	Synthetic	ring_resonance	0.087
0.937	253.289993	Polymer	1.99	Sputtering	Wet Etch	2.08	900C_3hr	1,501.449951	TM	-7.55	53.82	176.070007	37.07	13.951	3.51	43.540001	83.349998	0.465	1.659	0.867	BATCH_42	Measurement	ring_resonance	0.102
1.041	458.179993	SiO2	3.47	PECVD	RIE	2.91	900C_1hr	1,556.650024	TM	1.81	73.260002	25.700001	12.38	3.193	1.539	87.809998	86.830002	0.325	1.637	0.937	BATCH_5	Synthetic	ring_resonance	0.186
1.603	277.149994	Polymer	2.83	PECVD	ICP	1.51	900C_1hr	1,529.859985	TE	7.71	73.510002	86.07	32.48	13.19	3.617	44.549999	84.440002	0.252	1.863	0.722	BATCH_6	Synthetic	OTDR	0.102
0.789	381.390015	Polymer	4.7	LPCVD	RIE	4.35	900C_1hr	1,512.349976	TE	8.57	29.75	69.279999	12.95	6.294	4.076	72.519997	80.730003	0.22	1.582	0.819	BATCH_32	Measurement	ring_resonance	0.041
1.381	467.670013	Polymer	1.45	Sputtering	RIE	1.94	1000C_1hr	1,584.599976	TE	4.42	34.57	40.330002	43.919998	9.708	2.08	77.730003	42.490002	0.343	1.964	0.764	BATCH_31	Measurement	microring_Q	0.158
1.338	203.190002	Polymer	2.31	LPCVD	RIE	2.49	900C_3hr	1,516.810059	TM	-2.68	45.09	75.559998	29.32	13.677	4.41	63.400002	80.370003	0.2	1.916	0.727	BATCH_10	Measurement	microring_Q	0.076
0.823	265.720001	Polymer	1.87	LPCVD	Wet Etch	4.7	No_Anneal	1,578.920044	TM	6.2	30.120001	155.339996	34.73	9.181	2.442	49.400002	42.119999	0.32	1.95	0.712	BATCH_27	Measurement	ring_resonance	0.032
1.299	281.290009	Polymer	3.85	PECVD	RIE	1.68	900C_1hr	1,553.75	TM	-2.46	21.76	124.629997	33.68	17.795	4.893	50.57	42.919998	0.058	1.588	0.75	BATCH_22	Synthetic	OTDR	0.143
1.151	481.73999	SiO2	4.1	PECVD	ICP	0.6	900C_1hr	1,518.869995	TE	7.5	41.959999	57.369999	29.82	5.829	1.429	68.290001	44.52	0.419	1.636	0.783	BATCH_49	Measurement	cut-back	0.041
1.456	280.26001	Air	3.74	LPCVD	RIE	0.89	900C_1hr	1,510.050049	TE	-0.1	73.730003	121.239998	12.43	6.939	4.187	69.239998	75.940002	0.103	1.957	0.881	BATCH_28	Measurement	OTDR	0.041
1.212	362.600006	Polymer	4.99	LPCVD	Wet Etch	0.98	No_Anneal	1,517.959961	TM	-6.7	78.639999	196.630005	25.5	1.772	0.356	65.739998	75.690002	0.15	1.974	0.701	BATCH_49	Measurement	microring_Q	0.086
1.597	509.73999	Polymer	2.8	PECVD	ICP	0.95	900C_3hr	1,594.209961	TM	3.75	26.27	73.129997	30.120001	4.307	0.936	81.18	78.330002	0.362	1.864	0.897	BATCH_42	Synthetic	cut-back	0.025
0.755	279.470001	Air	1.3	Sputtering	Wet Etch	1.19	1000C_1hr	1,595.27002	TM	-6.38	23.24	80.529999	2.38	2.194	3.084	47.919998	77.489998	0.294	1.685	0.736	BATCH_27	Measurement	cut-back	0.112
1.53	536.409973	Polymer	3.55	Sputtering	RIE	2.23	No_Anneal	1,550.47998	TM	0.02	75.919998	26.4	36.599998	17.127001	4.252	49.419998	44.849998	0.087	1.91	0.738	BATCH_34	Measurement	OTDR	0.094
1.539	369.519989	SiO2	1.19	Sputtering	ICP	2.14	1000C_1hr	1,587.579956	TM	1.59	60.389999	90.839996	43.27	13.025	2.607	87.029999	40.34	0.01	1.754	0.857	BATCH_39	Measurement	OTDR	0.012
1.177	372.769989	SiO2	1.76	Sputtering	ICP	0.99	900C_3hr	1,568.969971	TM	6.92	73.720001	33.709999	15.53	7.445	3.964	77.190002	70.440002	0.498	1.672	0.907	BATCH_14	Synthetic	OTDR	0.175
0.83	535.919983	Polymer	2.13	LPCVD	Wet Etch	4.62	900C_1hr	1,516.48999	TM	4.66	46.970001	95.839996	37.970001	12.415	2.779	66.220001	86.160004	0.357	1.62	0.884	BATCH_5	Measurement	OTDR	0.192
0.563	207.339996	Air	4.98	LPCVD	RIE	2.42	900C_1hr	1,533.290039	TM	-3.74	30.110001	57.82	5.84	3.369	3.028	66.410004	41.77	0.434	1.736	0.949	BATCH_47	Measurement	OTDR	0.092
1.902	352.600006	Polymer	3.97	Sputtering	Wet Etch	3.88	1000C_1hr	1,578.400024	TE	-1.71	45.080002	75.809998	12.54	2.576	1.503	68.580002	86.690002	0.171	1.58	0.855	BATCH_42	Synthetic	microring_Q	0.066
1.512	360.839996	Air	1.88	LPCVD	ICP	1.49	1000C_1hr	1,554.619995	TE	-9.39	73.209999	111.720001	13.68	4.861	2.263	68.949997	66.239998	0.3	1.599	0.885	BATCH_11	Synthetic	cut-back	0.052
1.22	584.960022	SiO2	2.72	Sputtering	RIE	2.77	1000C_1hr	1,526.640015	TM	-6.5	34.849998	176.949997	27.440001	6.734	2.07	85.629997	76.32	0.115	1.567	0.859	BATCH_23	Synthetic	OTDR	0.087
1.567	460.019989	SiO2	2.72	PECVD	RIE	1.8	1000C_1hr	1,509.680054	TE	5.06	45.380001	105.989998	20.85	3.624	1.474	70.459999	42.470001	0.1	1.627	0.812	BATCH_26	Measurement	cut-back	0.071
0.641	553.820007	SiO2	1.98	Sputtering	RIE	3.86	1000C_1hr	1,591.030029	TE	-1.5	51.360001	71.169998	2.16	1.771	0.827	81.209999	83.730003	0.454	1.607	0.918	BATCH_14	Synthetic	cut-back	0.111
0.5	413.720001	Air	1.3	LPCVD	ICP	4.26	900C_1hr	1,576.290039	TM	-6.87	25.74	177.600006	36.16	15.094	3.992	42.330002	78.379997	0.02	1.685	0.795	BATCH_27	Synthetic	OTDR	0.091
0.852	235.320007	Polymer	4.22	PECVD	Wet Etch	0.85	900C_3hr	1,534.02002	TM	-8.77	41.91	111.800003	34.07	8.351	2.017	79.68	42.5	0.289	1.765	0.821	BATCH_25	Synthetic	microring_Q	0.124
1.736	428.290009	Polymer	1.58	LPCVD	Wet Etch	2.95	1000C_1hr	1,541.310059	TM	7.87	65.099998	122.389999	12.15	6.2	3.496	48.330002	70.940002	0.051	1.79	0.887	BATCH_33	Synthetic	ring_resonance	0.068
0.695	370.970001	Polymer	2.77	LPCVD	ICP	2.67	1000C_1hr	1,567.579956	TE	-1.54	27.559999	106.709999	29.66	3.776	0.632	64.5	55.41	0.286	1.868	0.893	BATCH_13	Measurement	ring_resonance	0.056
1.584	593.880005	Air	4.99	Sputtering	ICP	1.34	No_Anneal	1,536.23999	TE	9.89	69.959999	156.160004	22.629999	6.188	2.507	48.84	57.029999	0.059	1.699	0.73	BATCH_44	Measurement	microring_Q	0.117
1.369	553.059998	SiO2	4.25	Sputtering	ICP	1.27	No_Anneal	1,547.209961	TE	-4.99	72.32	187.860001	13.49	3.628	1.379	47.049999	49.400002	0.323	1.924	0.752	BATCH_3	Measurement	cut-back	0.036
0.793	303.029999	Air	1.03	Sputtering	RIE	0.95	900C_3hr	1,525.5	TE	-4.4	75.279999	47.59	48.450001	18.351999	3.533	65.510002	40.790001	0.436	1.828	0.894	BATCH_37	Measurement	cut-back	0.097
1.41	273.359985	SiO2	2.76	LPCVD	RIE	3.23	1000C_1hr	1,536.650024	TM	6.09	78.339996	183.539993	27.68	4.875	1.368	84.550003	84.82	0.464	1.952	0.712	BATCH_36	Synthetic	ring_resonance	0.04
1.406	205.169998	Polymer	3.53	PECVD	RIE	2.08	900C_3hr	1,538.680054	TM	8.84	46.259998	30.280001	22.66	7.782	2.975	71.110001	74.550003	0.432	1.696	0.938	BATCH_21	Measurement	cut-back	0.06
1.901	354.98999	Air	3.42	PECVD	ICP	0.8	1000C_1hr	1,569.439941	TE	0.88	23.639999	85.209999	35.560001	10.351	2.398	50.740002	47.529999	0.333	1.572	0.878	BATCH_24	Synthetic	OTDR	0.073
1.206	292.679993	Air	4.26	Sputtering	RIE	3.34	No_Anneal	1,553.47998	TM	1.34	57.860001	64.529999	14.98	4.098	1.869	43.639999	51.240002	0.417	1.565	0.862	BATCH_43	Measurement	microring_Q	0.071
0.51	218.270004	Polymer	2.43	PECVD	ICP	1.22	900C_1hr	1,539.550049	TM	-9.91	30.82	187.75	48.950001	21.346001	4.034	46.700001	89.82	0.148	1.619	0.911	BATCH_47	Synthetic	cut-back	0.079
1.493	292.690002	Air	1.55	Sputtering	RIE	4.34	900C_3hr	1,566.349976	TM	-6.92	25.110001	107.910004	27.17	14.521	4.961	88.690002	64.889999	0.169	1.749	0.817	BATCH_7	Measurement	OTDR	0.175
0.807	510.149994	Air	1.58	LPCVD	RIE	1.39	No_Anneal	1,572.900024	TM	-7.17	52.150002	137.089996	13.13	2.968	0.894	52.529999	82.279999	0.488	1.523	0.709	BATCH_12	Measurement	cut-back	0.151
0.867	504.970001	Air	2.03	PECVD	RIE	0.91	No_Anneal	1,579.189941	TM	1.81	20.700001	139.880005	8.12	3.353	3.335	65.650002	68.650002	0.023	1.929	0.868	BATCH_22	Synthetic	microring_Q	0.127
0.614	231.839996	SiO2	4.69	PECVD	Wet Etch	4.05	900C_3hr	1,578.02002	TM	-3.76	41.02	92.169998	29.389999	14.012	4.506	48.779999	53.700001	0.468	1.873	0.933	BATCH_34	Synthetic	ring_resonance	0.168
1.607	424.859985	SiO2	3.57	LPCVD	ICP	1.89	1000C_1hr	1,593.920044	TM	1.39	34.77	122.209999	18.52	9.981	4.505	48.66	70.269997	0.48	1.736	0.934	BATCH_36	Measurement	ring_resonance	0.051
0.925	425.690002	Air	4.1	Sputtering	RIE	4.97	900C_1hr	1,542	TE	9.35	56.93	116.959999	34.860001	10.859	2.772	63.509998	74.379997	0.025	1.813	0.76	BATCH_21	Measurement	microring_Q	0.142
1.173	220.149994	Polymer	4.33	PECVD	ICP	0.71	No_Anneal	1,515.359985	TM	5.27	39.200001	141.740005	12.46	4.444	3.037	56.150002	56.689999	0.193	1.572	0.784	BATCH_40	Measurement	microring_Q	0.039
1.004	313.859985	Air	4.43	Sputtering	RIE	4.13	1000C_1hr	1,576.390015	TM	2.6	37.34	198.089996	6.31	4.237	4.505	80.470001	84.400002	0.204	1.799	0.728	BATCH_28	Synthetic	ring_resonance	0.137
1.341	262.540009	SiO2	3.63	PECVD	RIE	1.93	900C_3hr	1,564.26001	TM	4.97	38.07	186.110001	35.130001	7.487	1.737	69.230003	61.990002	0.468	1.604	0.922	BATCH_6	Synthetic	cut-back	0.078
1.906	240.990005	Polymer	3.98	Sputtering	Wet Etch	1.07	No_Anneal	1,500.869995	TE	2.66	46.700001	133.490005	12.47	4.438	2.426	54.32	64.169998	0.03	1.805	0.92	BATCH_48	Synthetic	ring_resonance	0.11
0.935	521.590027	Air	3.24	Sputtering	Wet Etch	1.04	No_Anneal	1,518.25	TM	-0.72	30.01	119.769997	16.98	4.335	1.997	50.450001	64.949997	0.026	1.87	0.804	BATCH_2	Synthetic	cut-back	0.022
1.921	429.089996	SiO2	3.13	Sputtering	Wet Etch	4.92	900C_1hr	1,541.849976	TM	9.46	40.919998	106.379997	48.889999	21.028	4.083	53.080002	47.799999	0.341	1.559	0.949	BATCH_12	Measurement	OTDR	0.166
1.949	571.719971	Polymer	1.38	Sputtering	ICP	1.68	900C_3hr	1,583.25	TE	-9.11	37.810001	105.639999	38.060001	11.339	2.468	56.599998	44.970001	0.336	1.845	0.824	BATCH_8	Measurement	OTDR	0.1
1.476	386.089996	Air	1.04	PECVD	Wet Etch	4.43	900C_3hr	1,507.01001	TE	-9.42	62.150002	97.489998	49.59	26.013	4.971	53.779999	66.580002	0.421	1.812	0.848	BATCH_24	Synthetic	OTDR	0.133
0.513	517.830017	Polymer	2.04	Sputtering	ICP	3.36	900C_3hr	1,594	TM	6.72	49.57	148.470001	47.279999	24.062	4.752	63.349998	89.290001	0.112	1.912	0.764	BATCH_23	Synthetic	OTDR	0.189
1.534	348.940002	Polymer	2.92	LPCVD	Wet Etch	4.04	900C_1hr	1,599.589966	TE	2.11	36.110001	106.910004	32.060001	6.768	1.569	75.269997	51	0.154	1.6	0.755	BATCH_48	Measurement	OTDR	0.156
1.855	369.600006	Polymer	1.13	PECVD	Wet Etch	4.81	1000C_1hr	1,572.469971	TE	-7.21	20.450001	124.410004	21.08	7.151	2.857	59.349998	64.160004	0.063	1.696	0.785	BATCH_7	Measurement	cut-back	0.096
0.523	271.380005	Polymer	4.14	Sputtering	ICP	1.24	No_Anneal	1,577.930054	TM	-8.14	62.48	154.589996	16.530001	7.816	4.188	51.310001	44.869999	0.363	1.753	0.759	BATCH_3	Measurement	microring_Q	0.083
1.027	455.980011	Polymer	2.05	PECVD	Wet Etch	0.52	900C_3hr	1,504.810059	TE	5.99	62.200001	74.129997	28.32	11.258	3.705	64.480003	63.209999	0.479	1.885	0.704	BATCH_28	Synthetic	cut-back	0.118
1.787	489.820007	Polymer	1.73	PECVD	ICP	3.8	900C_1hr	1,505.640015	TE	6.8	30.66	127.769997	33.75	3.29	0.801	80.75	68.910004	0.364	1.738	0.79	BATCH_35	Measurement	OTDR	0.01
1.79	411.929993	Polymer	1.08	LPCVD	ICP	3.35	1000C_1hr	1,530	TE	9.05	48.779999	93.910004	14.5	4.808	2.586	67.760002	75.269997	0.019	1.586	0.901	BATCH_16	Measurement	cut-back	0.151
1.875	326.640015	Polymer	4.4	Sputtering	Wet Etch	3.47	1000C_1hr	1,584.369995	TE	-6.39	62.91	195.220001	36.310001	6.763	1.623	54.849998	56.82	0.117	1.848	0.916	BATCH_49	Measurement	OTDR	0.086
0.685	568.349976	Polymer	3.23	LPCVD	ICP	4.87	1000C_1hr	1,521.689941	TE	-5.73	46.110001	156.889999	4.36	2.649	2.655	52.09	52.389999	0.459	1.508	0.815	BATCH_5	Measurement	OTDR	0.079
0.833	279.450012	SiO2	3.39	LPCVD	Wet Etch	3.42	900C_3hr	1,506.380005	TE	2.55	73.400002	190.75	46.73	22.249001	4.363	86.379997	65.300003	0.024	1.864	0.95	BATCH_4	Synthetic	microring_Q	0.043
0.794	368.579987	SiO2	4.15	LPCVD	Wet Etch	4.54	1000C_1hr	1,556.26001	TE	-0.36	46.919998	81.099998	48	17.499001	3.496	75.470001	89.470001	0.26	1.938	0.759	BATCH_16	Synthetic	cut-back	0.077
1.694	407.339996	SiO2	1.55	LPCVD	Wet Etch	1.88	900C_3hr	1,509.22998	TM	3.07	36.639999	72.660004	44.349998	4.067	0.521	64.099998	46.310001	0.255	1.669	0.872	BATCH_30	Synthetic	cut-back	0.199
1.811	294.23999	SiO2	1.32	LPCVD	RIE	3.62	1000C_1hr	1,599.869995	TE	-3.99	79.470001	20.030001	34.919998	14.564	3.85	48.619999	89.370003	0.431	1.976	0.742	BATCH_25	Synthetic	OTDR	0.099
0.737	247.199997	SiO2	4.7	PECVD	RIE	2.81	No_Anneal	1,540.050049	TM	7.93	51.25	180.509995	7.26	4.877	4.19	48.52	86.019997	0.208	1.585	0.815	BATCH_37	Synthetic	microring_Q	0.065
1.459	343.809998	SiO2	1.66	Sputtering	Wet Etch	4.42	1000C_1hr	1,515.280029	TE	6.58	29.540001	184.800003	38.049999	3.28	0.715	43.619999	89.739998	0.497	1.684	0.893	BATCH_49	Synthetic	cut-back	0.018
1.837	461.51001	Polymer	4.55	PECVD	Wet Etch	1.52	No_Anneal	1,575.900024	TM	0.92	73.169998	134.279999	13.77	3.034	1.141	74.720001	67.720001	0.34	1.889	0.795	BATCH_48	Synthetic	cut-back	0.163
1.527	257.350006	Air	2.94	Sputtering	ICP	4.59	1000C_1hr	1,546.890015	TE	-4.7	29.450001	132.929993	17.93	9.93	4.423	70.629997	49.860001	0.283	1.931	0.757	BATCH_20	Synthetic	ring_resonance	0.03
0.915	339.730011	Polymer	2.73	PECVD	Wet Etch	1.36	900C_1hr	1,550.25	TM	4.04	57.93	96.790001	28.16	6.648	1.931	41.810001	51.16	0.338	1.6	0.908	BATCH_50	Synthetic	cut-back	0.143
1.775	563.469971	Air	1.92	Sputtering	Wet Etch	2.31	1000C_1hr	1,511.390015	TM	-2.53	27.66	173.070007	8.25	4.163	2.99	72.019997	85.339996	0.307	1.68	0.923	BATCH_7	Measurement	cut-back	0.126
1.276	291.25	SiO2	3.48	Sputtering	ICP	3.86	900C_1hr	1,537.170044	TE	-2.84	64.629997	64.879997	45.59	7.485	1.508	77.540001	87.080002	0.048	1.808	0.877	BATCH_20	Synthetic	cut-back	0.027
1.22	299.309998	Polymer	2.24	LPCVD	ICP	3.3	No_Anneal	1,553.030029	TM	2.04	79.800003	74.629997	36.34	7.432	1.514	60.18	53.5	0.189	1.983	0.798	BATCH_39	Synthetic	cut-back	0.04
0.827	203.860001	SiO2	2.08	PECVD	Wet Etch	2.23	1000C_1hr	1,565.819946	TM	3.55	45.400002	49.130001	25.23	2.29	0.388	59.59	69.050003	0.436	1.83	0.739	BATCH_23	Synthetic	OTDR	0.079
1.764	413.600006	Polymer	1.89	Sputtering	RIE	2.18	No_Anneal	1,554.300049	TE	-0.56	60.290001	161.020004	20.41	2.182	0.526	86.480003	51.689999	0.452	1.839	0.849	BATCH_26	Measurement	microring_Q	0.066
1.627	340.73999	Polymer	1	LPCVD	ICP	2.28	900C_1hr	1,581.079956	TM	-3.34	79.230003	78.68	36.419998	16.625	4.378	44.439999	63.689999	0.198	1.518	0.837	BATCH_8	Measurement	OTDR	0.086
1.61	226.130005	SiO2	2.61	Sputtering	ICP	0.63	900C_1hr	1,546.790039	TM	-1.7	62.950001	154.889999	34.060001	11.952	3.147	80.93	40.52	0.193	1.63	0.815	BATCH_31	Synthetic	cut-back	0.012
0.865	484.299988	Polymer	1.28	Sputtering	ICP	3.7	1000C_1hr	1,568.51001	TM	2.39	74.949997	125.910004	21.629999	9.829	4.223	79.290001	72.32	0.074	1.934	0.916	BATCH_44	Measurement	OTDR	0.17
1.941	416.790009	SiO2	2.22	Sputtering	Wet Etch	4.95	900C_1hr	1,574.810059	TE	4.99	61.77	88.839996	23.879999	10.204	3.584	59.650002	79.330002	0.438	1.961	0.941	BATCH_36	Synthetic	ring_resonance	0.049
0.954	500.48999	SiO2	2.74	Sputtering	ICP	4.25	900C_3hr	1,509.189941	TE	-5	58.700001	84.489998	39.990002	3.836	0.648	63.700001	57.669998	0.275	1.579	0.87	BATCH_39	Measurement	cut-back	0.021
0.809	505.23999	SiO2	2.95	PECVD	Wet Etch	3.91	No_Anneal	1,531.670044	TM	2.85	35.639999	93.650002	32.450001	7.098	1.79	80.529999	50.07	0.286	1.61	0.746	BATCH_50	Synthetic	cut-back	0.054
1.476	317.299988	Air	3.82	LPCVD	RIE	3.64	No_Anneal	1,505.51001	TM	-3.72	45.189999	192.309998	16.27	9.149	4.967	88.519997	88.419998	0.038	1.843	0.806	BATCH_21	Synthetic	ring_resonance	0.104
1.916	341.459991	Air	2.24	PECVD	ICP	4.25	900C_3hr	1,596.27002	TE	9.49	72.529999	55.43	39.110001	14.652	3.575	72.330002	86.540001	0.204	1.756	0.782	BATCH_44	Synthetic	OTDR	0.011
0.7	430.190002	Polymer	2.04	LPCVD	RIE	0.55	900C_1hr	1,556.040039	TM	1.92	67.629997	192.839996	6.3	2.612	1.176	85.540001	77.589996	0.134	1.604	0.72	BATCH_46	Synthetic	cut-back	0.022
1.528	491.200012	SiO2	4.35	PECVD	RIE	1.69	900C_1hr	1,539.969971	TE	-1.32	30.610001	82.160004	35.27	2.095	0.412	75.18	82.739998	0.034	1.709	0.762	BATCH_28	Synthetic	cut-back	0.033
1.231	403.809998	SiO2	3.54	Sputtering	RIE	4.48	1000C_1hr	1,544.819946	TE	3.95	76.07	86.760002	40.310001	20.224001	4.79	43.400002	79.129997	0.039	1.83	0.894	BATCH_39	Measurement	OTDR	0.19
0.646	483.709991	Air	3.61	LPCVD	ICP	0.88	No_Anneal	1,568.109985	TM	-4.11	41.970001	75.949997	21.68	4.046	1.285	67.269997	81.18	0.132	1.538	0.71	BATCH_9	Synthetic	ring_resonance	0.186